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Chinese Optics Letters, Volume. 20, Issue 3, 031601(2022)

AgGeSbTe thin film as a negative heat-mode resist for dry lithography

Xingwang Chen1, Lei Chen1, Ying Wang1, Tao Wei1,2、*, Jing Hu1, Miao Cheng1, Qianqian Liu1、**, Wanfei Li1, Yun Ling1,3, and Bo Liu1、***
Author Affiliations
  • 1Suzhou Key Laboratory for Nanophotonic and Nanoelectronic Materials and Its Devices, School of Materials Science and Engineering, Suzhou University of Science and Technology, Suzhou 215009, China
  • 2State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
  • 3School of Electronic & Information Engineering, Suzhou University of Science and Technology, Suzhou 215009, China
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    Article index updated: Feb. 10, 2025

    Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.
    The article is cited by 6 article(s) from Web of Science.
    The article is cited by 3 article(s) CLP online library. (Some content might be in Chinese.)
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    Xingwang Chen, Lei Chen, Ying Wang, Tao Wei, Jing Hu, Miao Cheng, Qianqian Liu, Wanfei Li, Yun Ling, Bo Liu, "AgGeSbTe thin film as a negative heat-mode resist for dry lithography," Chin. Opt. Lett. 20, 031601 (2022)

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    Paper Information

    Category: Optical Materials

    Received: Nov. 17, 2021

    Accepted: Dec. 29, 2021

    Posted: Dec. 30, 2021

    Published Online: Jan. 26, 2022

    The Author Email: Tao Wei (weitao@usts.edu.cn), Qianqian Liu (liuqianqian@usts.edu.cn), Bo Liu (liubo@mail.usts.edu.cn)

    DOI:10.3788/COL202220.031601

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology