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Infrared and Laser Engineering, Volume. 47, Issue 3, 321004(2018)

Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering

Wang Lishuan1,2、*, Yang Xiao2, Liu Dandan2, Jiang Chenghui2, Liu Huasong1,2, Ji Yiqin1,2, Zhang Feng2, Fan Rongwei1, and Chen Deying1
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    Wang Lishuan, Yang Xiao, Liu Dandan, Jiang Chenghui, Liu Huasong, Ji Yiqin, Zhang Feng, Fan Rongwei, Chen Deying. Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering[J]. Infrared and Laser Engineering, 2018, 47(3): 321004

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    Paper Information

    Category: 先进光学材料

    Received: Oct. 10, 2017

    Accepted: Nov. 20, 2017

    Published Online: Apr. 26, 2018

    The Author Email: Lishuan Wang (wanglishuan8358@163.com)

    DOI:10.3788/irla201847.0321004

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology