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Chinese Optics Letters, Volume. 8, Issue s1, 73(2010)

Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

Stefan Jakobs¹, Marc Lappschies¹, Uwe Schallenberg¹, Olaf Stenzel², and Steffen Wilbrandt²

Author Affiliations

¹Mso Jena GmbH, Carl-Zeiss-Promenade 10, 07745 Jena, Germany

²Fraunhofer IOF, Albert-Einstein-Stra?e 7, 07745 Jena, Germany

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References(6)

[1] [1] O. Stenzel S. Wilbrandt, N. Kaiser, M. Vinnichenko, F. Munnik, A. Kolitsch, A. Chuvilin, U. Kaiser, J. Ebert, S. Jakobs, A. Kaless, S. W¨uthrich, O. Treichel, B. Wunderlich, M. Bitzer, and M. Grosel, Thin Solid Films 517, 6058 (2009).

[2] [2] A. Zoller, S. Bei wenger, R. Gotzelmann, and K. Matl, Proc. SPIE 2253, 394 (1994).

[3] [3] O. Stenzel, The Physics of Thin Film Optical Spectra: An Introduction (Springer-Verlag, Berlin Heidelberg, 2005).

[4] [4] S. Wilbrandt, O. Stenzel, N. Kaiser, M. K. Trubetskov, and A. V. Tikhonravov, Appl. Opt. 47, C49 (2008).

[5] [5] R. Thielsch, A. Gatto, and N. Kaiser, Appl. Opt. 41, 3211 (2002).

[6] [6] A. Duparre, J. Ferre-Borrull, G. Notni, J. Steinert, and J. M. Bennett, Appl. Opt. 41, 154 (2002).

Cited By

[1] Mark Ziter, Gary Carver, Sarah Locknar, Tim Upton, Bob Johnson. Laser-based assessment of optical interference filters with sharp spectral edges and high optical density. Surface and Coatings Technology, 241, 54(2014).

[2] Olaf Stenzel. Optical Coatings, 54, 187(2014).

[3] K?stutis Ju?kevi?ius, Martynas Audronis, Andrius Suba?ius, Simonas Ki?as, Tomas Tolenis, Rytis Buzelis, Ramutis Drazdys, Mindaugas Gaspariūnas, Vitalij Kovalevskij, Allan Matthews, Adrian Leyland. Fabrication of Nb2O5/SiO2 mixed oxides by reactive magnetron co-sputtering. Thin Solid Films, 589, 95(2015).

[4] J. A. Dobrowolski, Li Li, Michael Jacobson, David W. Allen. 2010 topical meeting on optical interference coatings: manufacturing problem. Applied Optics, 50, C408(2011).

[5] A. Voronov, S.A. Atarah. Control and broadband monitoring of transparent multilayer thin films deposited by magnetron sputtering. Surface and Coatings Technology, 347, 252(2018).

[6] J.W. Miller, M. Chesaux, D. Deligiannis, P. Mascher, J.D.B. Bradley. Low-loss GeO2thin films deposited by ion-assisted alternating current reactive sputtering for waveguide applications. Thin Solid Films, 709, 138165(2020).

[7] Norihiro Sei, Hiroshi Ogawa, Kawakatsu Yamada. Multi-range free-electron laser with a pair of dielectric multilayer mirrors. Applied Physics Letters, 101, 144101(2012).

[8] Luis V. Rodríguez-de Marcos, Juan I. Larruquert, José A. Méndez, José A. Aznárez. Self-consistent optical constants of SiO_2 and Ta_2O_5 films. Optical Materials Express, 6, 3622(2016).

[9] Hossein Shahrokhabadi, Majid Vaezzadeh, Alireza Bananej, Mohamad Hadi Maleki. Band gap energy and refractive index dependence of femtosecond laser induced damage threshold in dielectric thin films. Thin Solid Films, 636, 289(2017).

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Stefan Jakobs, Marc Lappschies, Uwe Schallenberg, Olaf Stenzel, Steffen Wilbrandt, "Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering," Chin. Opt. Lett. 8, 73 (2010)

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Paper Information

Received: Oct. 30, 2009

Accepted: --

Published Online: May. 14, 2010

The Author Email:

DOI:10.3788/COL201008s1.0073

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology