Laser & Optoelectronics Progress, Volume. 54, Issue 2, 23401(2017)
Simulation Investigation on Suppression Ratio of Dynamic Gas Lock in Extreme Ultraviolet Lithography
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Chen Jinxin, Wang Yu, Xie Wanlu. Simulation Investigation on Suppression Ratio of Dynamic Gas Lock in Extreme Ultraviolet Lithography[J]. Laser & Optoelectronics Progress, 2017, 54(2): 23401
Paper Information
Category: X-Ray Optics
Received: Oct. 8, 2016
Accepted: --
Published Online: Feb. 10, 2017
The Author Email: Chen Jinxin (ashion@aoe.ac.cn)
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