Researching on ArF Oscillator Amplifier Excimer Laser

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Acta Optica Sinica, Volume. 17, Issue 2, 140(1997)

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

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References(3)

[4] [4] I. J. Bigio, M. Slatkine. Attainment of the theoretical minimum input power for injection locking of an unstable-resonator KrF laser. Opt. Lett., 1981, 6(7): 236～238

[5] [5] C. Skordoulis, S. Spyrou, A. C. Cefalas. Gain and saturation measurements in a discharge excited F2 laser using an oscillator amplifier configuration. Appl. Phys., 1990, B51(2): 141～145

[6] [6] Lambda Physics. Oscillator Amplifier Excimer Laser LPX 150, 250 & 350, Printed 05/1991

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Researching on ArF Oscillator Amplifier Excimer Laser[J]. Acta Optica Sinica, 1997, 17(2): 140

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Paper Information

Category: Lasers and Laser Optics

Received: Feb. 1, 1996

Accepted: --

Published Online: Oct. 31, 2006

The Author Email:

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology