Acta Photonica Sinica, Volume. 52, Issue 6, 0631002(2023)

Optical Properties of Titanium-doped Gallium Oxide Thin Films by Thermal Atomic Layer Deposition

Cunyu LI1,2, Xiangping ZHU1,2, Wei ZHAO1,2、*, Jichao LI1,2, and Jingpeng HU3
Author Affiliations
  • 1State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an 710119, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Xi'an Zhongke Atomic Precision Manufacturing Technology Co., Ltd., Xi'an 710110, China
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    Figures & Tables(12)
    XPS spectra of Ga2O3,TiO2 and TGO films
    XPS core level spectra of TiO2 film
    XPS core level spectra of Ga2O3 film
    O 1s core level spectra of Ga2O3 and TGO films
    GIXRD spectra of Ga2O3 and TGO films
    AFM morphology of TGO film with Ga(3)Ti(1)
    Refractive index and extinction coefficient of Ti-doped Ga2O3 films deposited on silicon
    Optical transmittance of Ga2O3,TiO2 and TGO thin films deposited on quartz
    Optical band gap of Ga2O3,TGO and TiO2 films
    The O 1s peak and Eg for Ga2O3 and TGO films
    Comparison of the band gap of Ga2O3 and TGO films by SP and XPS methods
    • Table 1. The parameters during the reaction process and the thickness of films

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      Table 1. The parameters during the reaction process and the thickness of films

      SampleNumber of Ga2O3Number of TiO2Thickness/nmMean square error
      Ga2O3420015.653.88
      Ga2O3∶TiO2=9∶13784213.631.51
      Ga2O3∶TiO2=6∶13606014.201.34
      Ga2O3∶TiO2=3∶131510514.741.43
      TiO2020016.004.75
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    Cunyu LI, Xiangping ZHU, Wei ZHAO, Jichao LI, Jingpeng HU. Optical Properties of Titanium-doped Gallium Oxide Thin Films by Thermal Atomic Layer Deposition[J]. Acta Photonica Sinica, 2023, 52(6): 0631002

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    Paper Information

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    Received: Feb. 17, 2023

    Accepted: Mar. 27, 2023

    Published Online: Jul. 27, 2023

    The Author Email: Wei ZHAO (weiz@opt.ac.cn)

    DOI:10.3788/gzxb20235206.0631002

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