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Chinese Journal of Lasers, Volume. 28, Issue 9, 783(2001)

Application of Enhanced Cavity in Far Detuning Atom-lithography

[in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Application of Enhanced Cavity in Far Detuning Atom-lithography[J]. Chinese Journal of Lasers, 2001, 28(9): 783

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    Paper Information

    Category: Laser physics

    Received: Jun. 22, 2000

    Accepted: --

    Published Online: Aug. 10, 2006

    The Author Email:

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology