Fig. 1. Sculptured chirp mirror^[35]. (a) Structural schematic, substrate, chirped film stack, and low-index layer, from bottom to top;(b) schematic refractive index profile of the chirp mirror

Fig. 2. Structure of wedged dispersive mirror^[36]

Fig. 3. GDD curves of complementary paired dispersive mirrors, the red and blue curves represent the GDD of the CM 1 and CM 2 dispersive mirrors, respectively, and the green curve represents the GDD of the paired mirrors^[37]

Fig. 4. Double angle dispersion mirror^[38]. (a) Conceptual diagram of double-angle dispersive mirror; (b) GDD pairing curves of double-angle dispersive mirror

Fig. 5. Non-uniformity paired dispersive mirror^[40]. (a)(b) GD and GDD of pair of complementary paired dispersive mirrors prepared with non-uniformity; (c) thickness of the dispersive mirror film layer is adjusted by setting the mirrors at different positions of the preparation disc

Fig. 6. Reflectivity and time delay for broadband mirrors, high-threshold mirrors and optimised broadband high-threshold mirrors^[42]

Fig. 7. Laser-induced damage threshold of different highly reflective mirrors measured at 1030 nm with a 350 ps pulse^[43]

Fig. 8. Broadband low-dispersion mirror coatings structure^[47]. (a) Schematic diagram of low-dispersion mirror based on quarter-wavelength layer structure; (b) chirped reflector with increased layer thickness demonstrating negative GDD; (c) schematic diagram of new low-dispersion mirror based on top periodically chirped layer and bottom structured quarter-wavelength layer

Fig. 9. Low dispersion mirror with hump structure^[15]. (a) Schematic diagram of broadband reflector based on sinusoidal modulation structure; (b) schematic diagram of new low-dispersion mirror based on hump and QWOT structures; (c)(d) reflectivity and dispersion of QWOT structure, hump structure and whole structure

Fig. 10. Schematic diagram of common deposition techniques. (a) Schematic diagram of magnetron sputtering^[52]; (b) schematic diagram of ion beam sputtering^[53]

Fig. 11. Schematic diagram of oblique angle deposition^[54]

Fig. 12. Structural schematic of a high laser damage threshold reflective thin film system^[56]. (a) Schematic of conventional combined film system design using alternating structures of high and low refractive index materials; (b) schematic of the design of new nano-stacked membrane system using alternating structures of nano-stacked and low refractive index materials

Fig. 13. Opto-mechanical design of the in situ broadband monitoring, incoming optical system (left) and outgoing optical system (right)^[57]

Fig. 14. Schematic diagram of in-situ phase measurement monitoring system^[58]

Fig. 15. Schematic diagram of on-line measurement system for spectral phase information^[59]

Fig. 16. Schematic diagram of real-time interference monitoring system^[61]

Fig. 17. Principle diagram of white light interferometer^[53]

Fig. 18. Reversibility of the nonlinear response of the dispersive mirror, with error bars representing the measurement error^[74]

Fig. 19. Pump-probe experimental results. (a) Temperature rise under the irradiation of a 30 fs pulse and a 1 ps pulse^[75]; (b) optical path diagram of the pump-probe experiment^[76]; (c) evolution of normalized reflectivity over time at different wavelengths^[76]

Fig. 20. Compression results of dispersive mirror^[78]. (a) TiO₂/SiO₂ dispersive mirror; (b) HfO₂/SiO₂ dispersive mirror

Fig. 21. Electric field distribution with different numbers of protective layers^[82]. (a) Electric field of the combined low-dispersive mirror with different numbers of protective layers, as the number of Al₂O₃ layers increases, the electric field in the narrow bandgap material decreases; (b) electric field of the optimized combined low-dispersive mirror with different numbers of protective layers

Fig. 22. Schematic diagram of peak electric field intensity^[84]. (a) Design with peak electric field intensity located within high-index layers; (b) field-optimized design with peak electric field intensity located within low-index layers

Fig. 23. High damage threshold dispersion mirror with low equivalent electric field^[87].(a) Film structure of dispersive mirror with high threshold; (b) distribution of electric field intensity with wavelength; (c) distribution of electric field intensity at 790 nm and 810 nm, as well as the average value within the first 4 μm of the film layers; (d) distribution of equivalent electric field intensity; (e) normalized spectrum of the incident pulse

Fig. 24. Time-domain dynamic electric field model^[88]. (a) Time-domain electric field distribution atwavelength of 800 nm; (b) time-domain electric field distribution at multiple wavelengths; (c) time-domain electric field distribution through Bragg mirror at multiple wavelengths; (d) local time-domain electric field intensity at the surface of 1 μm

Fig. 25. Laser induced damage characteristics of chirped mirrors. (a) Evolution of blister morphology on a dispersive mirror with varying incident pulse energy^[86]; (b) evolution of blister morphology on a highly dispersive mirror with varying incident pulse energy^[90]

Fig. 26. History of laser peak power^[95]. (a) Development of peak power, key technologies and facilities; (b) chirped pulse amplification mechanism

Fig. 27. SULF prototype laser^[95]

Fig. 28. Domestic and foreign representative products of broadband high damage threshold low dispersion ultrafast laser coatings. (a) Laseroptik GmbH, German; (b) Sandia National Laboratories, USA; (c) Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, China

Fig. 29. Interferometric autocorrelation function of the measured pulse using a prepared double-angle dispersive mirror, indicating a pulse duration of 4.3 fs^[38]

Fig. 30. Schematic diagram of the optical path structure of fully chirped mirror compensated Ti∶Sapphire laser^[97]

Fig. 31. Pulse compression experiment results^[98]. (a) Experimental D-scan traces of few-cycle pulses; (b) measured spectra (blue curve) and retrieved spectral phases (red curve); (c) temporal intensity envelope of Fourier transform limited pulse (blue curve) and retrieved pulses (red curve)

Fig. 32. Principle diagram of post-compression technique^[101]

Fig. 33. Post-compression technique^[102]. (a) Principle diagram of post-compression; (b) experimental demonstration of five-fold pulse compression and broadened spectrum in single-stage fused silica thin plate compressor; (c) results from two-stage fused silica thin plate compressor

Fig. 34. Schematic layout of the Er fiber chirped pulse amplification with the high-dispersion mirror compressor^[16]

Fig. 35. Experimental normalized electric field in time domain, duration of chirped pulse intensity full width at half maximum is 86 fs, compressed pulse duration is 55 fs^[108]

Fig. 36. Measured results of Cr∶ZnS laser system for different configurations^[110]