Fig. 1. Simulation curves under different duty cycles. (a) TM wave transmittance; (b) ER

Fig. 2. Simulation curves under different heights. (a) TM wave transmittance; (b) ER

Fig. 3. Cross-sectional energy distributions before and after introduction of antireflection coating. (a) Before; (b) after

Fig. 4. Simulation curves of different polarization elements. (a) TM wave transmittance; (b) ER

Fig. 5. Surface morphologies of films under different deposition rates. (a) 0.3 nm/s; (b) 0.5 nm/s; (c) 0.7 nm/s

Fig. 6. Micrographs of structure after degumming under different photoresist thicknesses. (a) 126 nm; (b) 213 nm; (c) 285 nm

Fig. 7. Metal Al wire grid structure fabricated by intermittent coating method

Fig. 8. SEM images. (a) Cross section (b) surface

Fig. 9. Spectral test curves. (a) TM wave transmittance; (b) ER

Fig. 10. Inversion simulation curves. (a) TM wave transmittance; (b) ER