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Opto-Electronic Engineering, Volume. 38, Issue 12, 35(2011)

Analysis on High Numerical Aperture Polarized Imaging

LIU Yong1,2、*, XING Ting-wen1, and YANG Xiong1
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  • 1[in Chinese]
  • 2[in Chinese]
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    [1] [1] Harry J Levinson. Principles of Lithography [M]. Washington, SPIE Press, 2010.

    [3] [3] Smith Bruce W, Cashmore Julian. Challenges in high NA, polarization, and photoresists [J]. Proc. of SPIE(S0277-786X), 2002, 4691: 11-24.

    [4] [4] Smith Bruce W, Zavyalova L, Estroff A. Benefiting from polarization – effects on high-NA imaging [J]. Proc. of SPIE(S0277-786X), 2004, 5377: 68-79.

    [5] [5] Smith Bruce W, Zhou Jian-ming, Xie Peng. Applications of TM polarized illumination [J]. Proc. of SPIE(S0277-786X), 2008, 6924: 0J1-12.

    [6] [6] Sang-Kon Kim. Analytical Approach to High-NA Images [J]. Proc. of SPIE(S0277-786X), 2007, 6520: 3D1-16.

    [8] [8] Mansuripur M. Certain computational aspects of vector diffraction problems [J]. J Opt Soc Am A(S1084-7529), 1989, 6: 786 -805.

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    LIU Yong, XING Ting-wen, YANG Xiong. Analysis on High Numerical Aperture Polarized Imaging[J]. Opto-Electronic Engineering, 2011, 38(12): 35

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    Paper Information

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    Received: Aug. 25, 2011

    Accepted: --

    Published Online: Dec. 22, 2011

    The Author Email: Yong LIU (liuyong-2009@qq.com)

    DOI:10.3969/j.issn.1003-501x.2011.12.007

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology