[1] [1] M. Spiegel, C. Gerhards, F. Huster et al.. Industrially attractive front contact formation methods for mechanically V-textured multicrystalline silicon solar cells［J］. Solar Energy Materials & Solar Cells, 2002, 74(1-4): 175～182

[2] [2] L. A. Dobrzanski, A. Drygala. Laser texturisation of crystalline silicon for solar cells [C]. 13th International Scientific Conference on Achievements in Mechanical and Materials Engineering, 2005, 127～130

[3] [3] J. Yoo. Reactive ion etching (RIE) technique for application in crystalline silicon solar cells [J]. Solar Energy, 2010, 84(4): 730～734

[4] [4] W. A. Nositschka, C. Beneking, O. Voigt et al.. Texturisation of multicrystalline silicon wafers for solar cells by reactive ion etching through colloidal masks［J］. Sol. Energy. Mat. Sol. C., 2003, 76(2): 155～166

[5] [5] Zhigang Liu, Tietun Sun, Jing An. Silicon etching in HF/HNO3/NH3·H2O/H2O system［J］. J. Electrochem. Soc., 2007, 154(1): D21～D29

[6] [6] S. W. Park, J. Kim, LEE Soo Hone. Application of acid texturing to multi-crystalline silicon wafers［J］. J. Korean Phys. Soc., 2003, 43(3): 423～426

[7] [7] Lin Yuqiong, Feng Shimeng, Wang Kunxia et al.. Effects of a fluorinated surfactant on the microstructure of textured surfaces of Mc-Si wafers ［J］. J. Materials Science & Engineering, 2011, 29(4): 502～505

[8] [8] B. Gonzalez-Diaz, R. Guerrero-Lemus, B. Diaz-Herrera et al.. Optimization of roughness reflectance and photoluminescence for acid textured mc-Si solar cells etched at different HF/HNO3 concentrations ［J］. Materials Science and Engineering: B, 2009, 159-160(15): 295～298

[9] [9] Milind S. Kulkarni, Henry F. Erk. Acid-based etching of silicon wafers: mass-transfer and kinetic effects［J］. J. Electrochem. Soc., 2000, 147(1): 176～188

[10] [10] Yuang-Tung Cheng, Jyh-Jier Ho, Song-Yeu Tsai et al.. Efficiency improved by acid texturization for multi-crystalline silicon solar cells ［J］. Solar Energy, 2011, 85(1): 87～94

[11] [11] Qian Yong, Feng Shimeng. Effect of multi-crystalline silicon pit-trap shape on the optical reflectance［J］. Acta Optica Sinica, 2012, 32(2): 0224001

[12] [12] Wang Kunxia, Feng Shimeng, Xu Huatian et al.. Relation between the multicrystalline silicon surface structure and the pit-trap effect［J］. Acta Optica Sinica, 2012, 32(3): 0324001

[13] [13] Yuan Genfu, Yao Yansheng, Chen Xuehui et al.. Experimental study on the quality of material surface applied laser-chemical combined etching ［J］. Chinese J. Lasers, 2010, 37(1): 281～283

[14] [14] Jiang Yurong, Qin Ruiping, Bian Changxian et al.. Texturing of silicon nanowire arrays by post-treatment in alkali solution［J］. Acta Optica Sinica, 2012, 32(8): 0816002

[15] [15] Zhao Zhennan. Heat Transfer［M］. Beijing: Higher Education Press, 2008.6

[16] [16] B. Schwartz, H. Robbins. Chemical etching of silicon, III, a temperature study in the acid system [J]. J. Electrochem. Soc., 1961, 108(4): 365～472