Fig. 1. Bottom gate of anti-overlapping TFT structure

Fig. 2. The design drawings of HT

Fig. 3. The design of channel drawing 5 mask and 4 mask

Fig. 4. The critical value of HT zone

Fig. 5. The influence trend of L and a on the value of b

Fig. 6. Film thickness trend

Fig. 7. The SEM picture of channel area after photoetching

Fig. 8. The SEM picture of channel area after ashing

Fig. 9. The influence trend of L on the value of c

Fig. 10. The picture of channel area after photoetching

Fig. 11. The SEM picture of channel area after etching

Fig. 12. The picture of channel area after etching and stripping