Laser & Optoelectronics Progress, Volume. 54, Issue 11, 113103(2017)

Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance

Chu Wenjing1、*, Zhang Xiqiang1, Shi Xiayu1, Zheng Youwei1, Lin Junliang1, Chen Mingyi1, Lin Jinxi1, Lin Jinhan1, and Yuan Ningyi2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    Chu Wenjing, Zhang Xiqiang, Shi Xiayu, Zheng Youwei, Lin Junliang, Chen Mingyi, Lin Jinxi, Lin Jinhan, Yuan Ningyi. Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance[J]. Laser & Optoelectronics Progress, 2017, 54(11): 113103

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Thin Films

    Received: May. 25, 2017

    Accepted: --

    Published Online: Nov. 17, 2017

    The Author Email: Chu Wenjing (wjchu@czamd.com)

    DOI:10.3788/lop54.113103

    Topics