[1] [1] Jiang Nianyun, Wang Yongru, Hou Desheng. High uniform violet ray illumination experimental device and its structure design[J]. Opto-Electronic Engineering, 1996, 23(1): 35-39.

[2] [2] Liu Pengfei, Yang Bo, Lu Kan. Design and research on the uniform illumination system of UV exposure machine[J]. Optical Instruments, 2012, 34(2): 31-36.

[3] [3] Zhou Chongxi, Lin Dajian, Li Zhan. Research of intensity distribution of uniform illumination system for optical photolithography[J]. Microfabrication Technology, 1996, 01: 23-28.

[4] [4] Li Fengyou. Study on Technology of Laser Direct Writing Photolithography[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2002.

[5] [5] Shen Zhaoguo. Study on Laser of 532 nm Green and 355 nm UV by LD Pumped[D]. Xi′an: Northwest University, 2009.

[6] [6] Huang Zhimeng. Study on LD Side-Pumped All-Solid-State 266 nm Ultraviolet Laser[D]. Xi′an: Northwest University, 2008.

[7] [7] Yan Wenping, Guo Zhenning, Lin Jieben, et al.. LED street lamp lens with high energy efficiency utilization based on reverse optimization design[J]. Acta Optical Sinica, 2015, 35(4): 0422008.

[8] [8] Qian Keyuan, Hu Xiaojia. Study of the optical systems with illuminance and luminanceuniformity simultaneously for LED lighting[J]. 2015, 35(2): 0208001.

[9] [9] Li Jinchao. Study on Key Technologies in UV-LED Fiber Lithography System[D]. Chongqing: Chongqing University, 2009.

[10] [10] J Hahn, G Grabosch, L Parthier, et al.. Critical enabling properties of CaF2 lens blanks for state of the art lithography tools[C]. SPIE, 2003, 50(40): 734-741.

[11] [11] W H Arnold. Towards 3 nm overlay and critical dimension uniformity: an integrated error budget for double patterning lithography[C]. SPIE, 2008, 6924: 692404.

[12] [12] Yao Hanmin, Hu Song. The Technology of Optical Projection Micro-Nano Processing[M]. Beijing: Beijing University of Technology Press, 2006: 4-9.

[13] [13] Li Mengyuan, Sun Jialue, Zhang Dawei, et al... Optical system design for ultraviolet-LED curing based on the structure of freeform surface [J]. Acta Optical Sinica, 2014, 34(12): 1222003.

[14] [14] Wang Guogui. Study and Design of Ultraviolet LED Lithography Light Source System[D]. Nanchang: Nanchang Hangkong University, 2013: 44-48.

[15] [15] Guo Liping, Huang Huijie, Wang Xiangzhao. Study of integrator rod in step and scan lithography[J]. Acta Photonica Sinica, 2006, 35(7): 981-985.

[16] [16] T Bizjak, T Mitra, D Hauschild, et al.. Novel refractive optics enable multipole off-axis illumination[J]. SPIE, 2008, 6924: 69242J.

[17] [17] Allen Jong-Woei Whang, Yi-Yung Chen, Yuan-Ting Teng. Designing uniform illumination systems by surface-tailored lens and configurations of LED arrays[J]. Journal of Display Technology, 2009, 5(3): 94-103.

[18] [18] Michael Bass, Eric W, Van Stryland, et al.. Handbook of Optics[M]. Washington: Optical Society of America Press, 1995: 1.121.14.

[19] [19] Ding Yi, Gu Peifu. Freeform reflector for uniform illumination[J]. Acta Optica Sinica, 2007, 27(3): 540-544.

[20] [20] Jing Lei, Liu Hua, Zhao Huifu, et al.. Compact collimator design for high-brightness light-emitting diode[J]. Acta Optica Sinica, 2011, 31(12): 1220011.

[21] [21] Qian Keyuan. Near field optical modeling of LED and design optimization for direct-type backlight optical system[J]. Acta Optica Sinica, 2015, 35(5): 0522001.

[22] [22] C C Sun, T X Lee, S H Ma. Precise optical modeling for LEDlighting verified by cross correlation in the midfield region[J]. Opt Lett, 2006, 31(14): 2193-2195.

[23] [23] Xin Di, Liu Hua, Lu Zhenwu, et al.. Optical design of the LED illumination system with adjustable view angle[J]. Acta Optica Sinica, 2013, 33(5): 0522003.

[24] [24] J Fruendt, M Jarczynsko, T Mitra. Simultaneous multiple uniform spot generation with micro optics[C]. SPIE, 2008, 7062: 70620S.

[25] [25] T Bizjak, T Mitra, L Aschke. Novel high through put micro-optical beam shapers reduce the complexity of macro optics in hyper-NA illumination system[C]. SPIE, 2007, 6520: 65202X.