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Opto-Electronic Engineering, Volume. 30, Issue 5, 1(2003)

A Study on Polarized Light Imaging in Super-Microlithography

[in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    [1] [1] RIZVI S A.National Technology Roadmap for Semiconductors:An Analysis and Perspective [J].SPIE,1998,3331:190-196.

    [2] [2] LEVENSON M D.Wavefront Engineering from 50nm to 100nm CD [J].SPIE,1997,3051:2-13.

    [3] [3] FINDERS J,JORRITSMA L,EURLINGS M,et al.Can DUV Take Us Below 100nm[J].SPIE,2001,4346:153-165.

    [4] [4] WAGNER C,KAISER W,MULKENS,et al.Advanced Technology for Extending Optical Lithography [J].SPIE,2000,4000:344-357.

    [5] [5] FLAGELLO D G,MULKENS J,WAGNER C.Optical Lithography into the Millennium:Sensitivity to Aberrations,Vibration and Polarization [J].SPIE,2000,4000:172-183.

    [6] [6] YEUNG M.Modeling High Numerical Aperture Optical Lithography [J].SPIE,1988,922:149-167.

    [7] [7] FLAGELLO D G,ROSENBLUTH A E,PROGLER C,et al.Understanding High Numerical Aperture Optical Lithography [J].Microelectronic Engineering,1992,17:105-108.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. A Study on Polarized Light Imaging in Super-Microlithography[J]. Opto-Electronic Engineering, 2003, 30(5): 1

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    Paper Information

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    Received: Apr. 9, 2003

    Accepted: --

    Published Online: Nov. 14, 2007

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology