Chinese Optics, Volume. 17, Issue 2, 324(2024)

Design and fabrication of liquid crystal wavefront corrector based on mask lithography

Ying DU1, Mei-rui CHEN1, Yu-tong LIU1, Zong-xin CAO1, Hong-min MAO1, Xiao-ping LI2, Hui-juan SUN3、*, and Zhao-liang CAO1、*
Author Affiliations
  • 1Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
  • 2Basic Department, Jiyuan Vocational and Technical College, Jiyuan 454682, China
  • 3Institute of Mathematics and Physics, Beijing Union University, Beijing 100101, China
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    Figures & Tables(14)
    Arrangement of liquid crystal molecules under the conditions (a) without applied voltage and (b) with applied voltage
    The liquid crystal passive driving electrode prepared in this paper. (a) Structure of driving electrode; (b) packaging structure of liquid crystal cell; (c) wiring between electrodes
    Design drawing of the driving connection board
    (a), (b) Different location pictures of gold-plated driving electrodes captured by the microscope; (c) packaged liquid crystal cell
    Fabricated liquid crystal wavefront corrector
    Optical layout for testing the response characteristic of liquid crystal wavefront corrector
    (a) Response results with single pixel driving; (b) corresponding relationship between the driving channel and pixel position
    (a) Intensity curve measured by oscilloscope; (b) phase as a function of response time
    (a) Phase as a function of gray level; (b) phase modulation error
    Optical setup for aberration correction
    Initial wave measurement results by Zygo interferometer and the resulting plane wave. (a) Interference fringe, (b) initial wave surface and (c) relative measured wavefront
    Positive and negative defocused aberration spherical wave. (a) Interference fringe, (b) stereoscopic wavefront and (c) two-dimensional wavefront under positive defocus; (d) interference fringe, (e) stereoscopic wavefront and (f) two-dimensional wavefront under negative defocus
    Correction results of horizontal tilt aberration. (a) Interference fringe and (b) wavefront before correction; (c) interference fringe and (d) wavefront after correction
    Zernike coefficients without and with correction
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    Ying DU, Mei-rui CHEN, Yu-tong LIU, Zong-xin CAO, Hong-min MAO, Xiao-ping LI, Hui-juan SUN, Zhao-liang CAO. Design and fabrication of liquid crystal wavefront corrector based on mask lithography[J]. Chinese Optics, 2024, 17(2): 324

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    Paper Information

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    Received: Aug. 14, 2023

    Accepted: --

    Published Online: Apr. 15, 2024

    The Author Email:

    DOI:10.37188/CO.2023-0137

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