Chinese Optics, Volume. 17, Issue 2, 324(2024)

Design and fabrication of liquid crystal wavefront corrector based on mask lithography

Ying DU1, Mei-rui CHEN1, Yu-tong LIU1, Zong-xin CAO1, Hong-min MAO1, Xiao-ping LI2, Hui-juan SUN3、*, and Zhao-liang CAO1、*
Author Affiliations
  • 1Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
  • 2Basic Department, Jiyuan Vocational and Technical College, Jiyuan 454682, China
  • 3Institute of Mathematics and Physics, Beijing Union University, Beijing 100101, China
  • show less

    Liquid crystal wavefront correctors (LCWFCs) exhibit high development cost and customization difficulties due to being fabricated based on the process technology of liquid crystal displays. To achieve specialized and low-cost development of LCWFCs, a liquid crystal wavefront corrector is fabricated by using the mask lithography method. Firstly, a 91-pixel passive liquid crystal driving electrode is designed and prepared based on the mask lithography technology and then, packaged as a liquid crystal optical correction unit. A circuit board for driver connection is designed and prepared to connect the optical correction unit and the driving circuit board. Next, the response characteristics of the LCWFC are tested, and the results show that the phase modulation is 5.5 λ, and the response time is 224 ms. Finally, the spherical waves are obtained and the static tilt aberrations are corrected based on Zygo interferometer. The results show that the LCWFC can generate positive and negative defocused wavefronts. Further, after correction of the horizontal tilt aberration, the coefficient of the first term of the Zernike polynomials is decreased from 1.18 to 0.16. Therefore, the aberration is corrected with the amplitude of 86%. This work may provide new ideas for the development of LCWFCs, and then expanding their application fields and scenarios.

    Keywords
    Tools

    Get Citation

    Copy Citation Text

    Ying DU, Mei-rui CHEN, Yu-tong LIU, Zong-xin CAO, Hong-min MAO, Xiao-ping LI, Hui-juan SUN, Zhao-liang CAO. Design and fabrication of liquid crystal wavefront corrector based on mask lithography[J]. Chinese Optics, 2024, 17(2): 324

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Aug. 14, 2023

    Accepted: --

    Published Online: Apr. 15, 2024

    The Author Email:

    DOI:10.37188/CO.2023-0137

    Topics