Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography

Liping Guo; Xiangzhao Wang; Huijie Huang

Chinese Optics Letters, Volume. 4, Issue 4, 04237(2006)

Liping Guo^1,2、*, Xiangzhao Wang¹, and Huijie Huang¹

¹Information Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800

²Graduate School of the Chinese Academy of Sciences, Beijing 100039

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References(11)

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CLP Journals

[1] Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001

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Liping Guo, Xiangzhao Wang, Huijie Huang, "Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography," Chin. Opt. Lett. 4, 04237 (2006)

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Paper Information

Category: Optical Design and Fabrication

Received: Oct. 9, 2005

Accepted: --

Published Online: Jun. 6, 2006

The Author Email: Liping Guo (guo_liping666@sohu.com)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology