Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Acta Optica Sinica, Volume. 40, Issue 9, 0931001(2020)

Study on High Reflective Film in 121.6 nm Far Ultraviolet

Jinyan Wang1,2, Jinlong Zhang1,2、*, Hongfei Jiao1,2, and Xinbin Cheng1,2
Author Affiliations
  • 1Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China
  • 2MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, 200092, China
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (11)
    Equations (0)
    References (15)
    Cited By (3)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Sep. 6, 2025

    The article is cited by 3 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Jinyan Wang, Jinlong Zhang, Hongfei Jiao, Xinbin Cheng. Study on High Reflective Film in 121.6 nm Far Ultraviolet[J]. Acta Optica Sinica, 2020, 40(9): 0931001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Thin Films

    Received: Jan. 3, 2020

    Accepted: Feb. 10, 2020

    Published Online: May. 6, 2020

    The Author Email: Jinlong Zhang (jinlong@tongji.edu.cn)

    DOI:10.3788/AOS202040.0931001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology