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Acta Optica Sinica, Volume. 40, Issue 9, 0931001(2020)

Study on High Reflective Film in 121.6 nm Far Ultraviolet

Jinyan Wang1,2, Jinlong Zhang1,2、*, Hongfei Jiao1,2, and Xinbin Cheng1,2
Author Affiliations
  • 1Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China
  • 2MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, 200092, China
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    Jinyan Wang, Jinlong Zhang, Hongfei Jiao, Xinbin Cheng. Study on High Reflective Film in 121.6 nm Far Ultraviolet[J]. Acta Optica Sinica, 2020, 40(9): 0931001

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    Paper Information

    Category: Thin Films

    Received: Jan. 3, 2020

    Accepted: Feb. 10, 2020

    Published Online: May. 6, 2020

    The Author Email: Jinlong Zhang (jinlong@tongji.edu.cn)

    DOI:10.3788/AOS202040.0931001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology