Laser & Infrared, Volume. 54, Issue 12, 1807(2024)

Current situation and prospect of InSb crystal growth simulation technology

YANG Wen-bo, ZHAO Chao, Dong Tao, SHE Wei-lin, and XING Wei-rong
Author Affiliations
  • 11th Research Institute of CETC, Bejing 100015, China
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    References(5)

    [16] [16] Ding C, Huang M, Zhong G, et al. A design of crucible susceptor for the seeds preservation during a seeded directional solidificationprocess[J]. Journal of Crystal Growth, 2014, 387: 73-80.

    [19] [19] Chen J C, Teng Y Y, Wun W T, et al. Numerical simulation of oxygen transport during the CZ silicon crystal growth process[J]. Journal of Crystal Growth, 2011, 318(1): 318-323.

    [20] [20] Teng Y Y, Chen J C, Lu C W, et al. Numerical simulation of the effect of heater position on the oxygen concentration in the CZ silicon crystal growth process[J]. International Journal of Photoenergy, 2012: 463-484.

    [22] [22] Lee S H, Mun Y H, Kim H. Oxygen content increasing mechanism in Czochralski (CZ) silicon crystals doped with heavy antimony under a double-type heat shield[J]. Journal of Crystal Growth, 2011, 325(1): 27-31.

    [23] [23] Takano K, Shirashi Y, Matsubara J, et al. Global simulation of the CZ silicon crystal growth up to 400 mm in diameter[J]. Journal of Crystal Growth, 2001, 229(1-4): 26-30.

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    YANG Wen-bo, ZHAO Chao, Dong Tao, SHE Wei-lin, XING Wei-rong. Current situation and prospect of InSb crystal growth simulation technology[J]. Laser & Infrared, 2024, 54(12): 1807

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    Paper Information

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    Received: May. 9, 2024

    Accepted: Apr. 3, 2025

    Published Online: Apr. 3, 2025

    The Author Email:

    DOI:10.3969/j.issn.1001-5078.2024.12.001

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