APPLIED LASER, Volume. 33, Issue 3, 318(2013)

Parameters Optimization of Process on Different Wavelength Laser Etching of Poly Silicon

Pei Shaohu1、*, XueWei2, Feng Aixin1,2,3, Sun Tietun3, Lv Yuwen1,4, Zhu Liang1, Zhu Baochun1, and Han Zhenchun1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
  • show less

    Poly silicon are more widely used in the manufacture of solar cells because of its increasingly sophisticated manufacturing process and low cost. Due to the high efficiency, low consumption characteristics, the laser processing technology plays an important role in the field of solar cell manufacturing. In order to explore the impact of the laser processing parameters on the effects of processing, Based on orthogonal test method, by laser processing in polycrystalline silicon wafer surface for single point multiple pulse punch experiment method and through the optical microscope and three dimensional profilometer to analyze and observe experimental results, this paper established the relationship between process parameters and laser drilling morphology effects and optimized parameter that laser shock polysilicon tablet with, analyzed the heat affected zone around the hole. And the test got the best aperture laser processing parameters: With the action time 45s, laser wavelength of 532 nm, energy 120 mJ and spot diameter 0.5 mm.

    Tools

    Get Citation

    Copy Citation Text

    Pei Shaohu, XueWei, Feng Aixin, Sun Tietun, Lv Yuwen, Zhu Liang, Zhu Baochun, Han Zhenchun. Parameters Optimization of Process on Different Wavelength Laser Etching of Poly Silicon[J]. APPLIED LASER, 2013, 33(3): 318

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Received: Nov. 5, 2012

    Accepted: --

    Published Online: Aug. 28, 2013

    The Author Email: Shaohu Pei (pei_shaohu@163.com)

    DOI:10.3788/al20133303.318

    Topics