Fig. 1. Schematic of surface scattered light

Fig. 2. Surface morphology of substrate

Fig. 3. Optical constants of TiO₂ material. (a) Refractive index; (b) extinction coefficient

Fig. 4. Optical constants of SiO₂ material. (a) Refractive index; (b) extinction coefficient

Fig. 5. Angle resolved scattering curves of two designed films. (a) Short-wave near substrate; (b) short-wave near air

Fig. 6. Theoretically designed curve of transmittance. (a) Transmittance; (b) reflectance

Fig. 7. Spectral test curve of film prepared at two processes. (a) Transmittance; (b) reflectance

Fig. 8. Layer sensitivity. (a) First-order layer; (b) second-order layer

Fig. 9. Transmittance curve influenced by random error

Fig. 10. Transmittance curve influenced by SiO₂ Tooling

Fig. 11. Surface morphologies of film prepared at two processes. (a) Process A; (b) process B

Fig. 12. SEM images of film. (a) Process A; (b) process B

Fig. 13. Integral scattering of film. (a) Process A; (b) process B

Fig. 14. Test and fitting curves of film prepared at different oxygen partial pressures

Fig. 15. Test and fitting curves of film prepared at same oxygen partial pressure

Fig. 16. Comparison of design and test curves