Chinese Journal of Lasers, Volume. 8, Issue 11, 8(1981)

High brightness electron beam source and its effects

Wang Zhijiang and Xu Zhizhan
Author Affiliations
  • [in Chinese]
  • show less
    References(11)

    [1] [1] Haine Μ. Ε.; Brit. J. Appl. Phys., 1952, 3, 40.

    [2] [2] Вrоеss A. N.; J. Sci. Instr., 1969, 2, 273.

    [3] [3] Crowe Α. V.; Progr. Opt., 1973, 11, 225.

    [4] [4] Feist W. F.; Adv. Electronics and El. Phya., 1968, Sup. 4.

    [5] [5] Tonomura Α.; J. Electron Microsc., 1979, 28, 1.

    [6] [6] Van der Mast; Electron Microsc., 1974, 1, 120.

    [7] [7] Puell Η.; Z. Naturforsch, 1970, 25a, 1870.

    [8] [8] Fauqui gnon C. F. Flonx; Phys. Fluids, 1970, 13, 386.

    [9] [9] Colombant D., G. F. Tonon; J. Appl. Phys., 1973, 44, 3524.

    [10] [10] Glibert Κ. M. et al., J. Appl. Phys., 1980, 61, 1449.

    [11] [11] McDermott D. B. et al.; Phys. Rev. Lett., 1978, 41, 1368.

    Tools

    Get Citation

    Copy Citation Text

    Wang Zhijiang, Xu Zhizhan. High brightness electron beam source and its effects[J]. Chinese Journal of Lasers, 1981, 8(11): 8

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: laser devices and laser physics

    Received: Oct. 20, 1980

    Accepted: --

    Published Online: Aug. 17, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics