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Infrared Technology, Volume. 44, Issue 12, 1332(2022)

Study on Dual-Fluid Spray Cleaning Technique for Single-wafer Particle Removal

Baihong LIU1, Weiping YANG1, Xiang LIANG1, Lili YANG1,2, Haonan DU1, Jiabing BAO1, Chunming SHI1, Yuexia MA1, Yane YIN1, and Yu DUAN1,2
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    LIU Baihong, YANG Weiping, LIANG Xiang, YANG Lili, DU Haonan, BAO Jiabing, SHI Chunming, MA Yuexia, YIN Yane, DUAN Yu. Study on Dual-Fluid Spray Cleaning Technique for Single-wafer Particle Removal[J]. Infrared Technology, 2022, 44(12): 1332

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    Received: Oct. 26, 2021

    Accepted: --

    Published Online: Feb. 4, 2023

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    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology