Fig. 1. Patch element of crossed dipoles. (a) Arrangement of elements; (b) transmission curves with different sizes

Fig. 2. Optically controlled active FSS structure of cross dipole slot-element

Fig. 3. Optically controlled active FSS of cross dipole slot-element. (a)Structure size; (b)size and arrangement of elements

Fig. 4. Spectra of optically controlled active FSS before and after illumination

Fig. 5. Technological process of preparing optically controlled active FSS

Fig. 6. Preparation of photoconductive FSS. (a) Coating photoconductive film; (b) spin coating; (c) exposure and development; (d) corrosion; (e) cleaning the photoresist; (f) photo of sample

Fig. 7. Effect of doping amount of CdSe on spectral response

Fig. 8. Effect of doping mole fraction of Cu on square resistance

Fig. 9. Preparation of metal FSS. (a)Spin coating; (b) exposure and development; (c) metal plating; (d) cleaning the photoresist; (e)sample of optically controlled active FSS

Fig. 10. Effect of annealing temperature on photoconductive thin film. (a) I-V logarithmic curves at different annealing temperatures; (b) relationship between annealing temperature and film contact square resistance

Fig. 11. (a) I-V curves at different annealing time; (b) relationship between annealing time and film contact square resistance

Fig. 12. Bright square resistance of photoconductive thin film irradiated with different frequencies light

Fig. 13. Bright square resistance of photoconductive thin film irradiated with different optical powers

Fig. 14. Schematic diagram of the measurement

Fig. 15. Curves of measurement

Fig. 16. Effect of optical power on shielding