Chinese Journal of Liquid Crystals and Displays, Volume. 39, Issue 6, 743(2024)
Influence of exposure process on the clarity of blue phase liquid crystal patterns
Fig. 3. （a）Texture image，（b）spectrum image and（c）Kossel diffraction image at 60 min of blue phase transition in TAMA reaction.
Fig. 4. Texture images of the BP（square）pattern regions with different exposure intensity.（a）20 mW/cm2；（b）23 mW/cm2；（c）25 mW/cm2；（d）30 mW/cm2.
Fig. 5. Bragg reflection spectra and the variation of central wavelength and full width at half maximum of the BP（square）pattern regions with different exposure intensity.（a）20 mW/cm2；（b）23 mW/cm2；（c）25 mW/cm2；（d）30 mW/cm2；（e）Variation of the central wavelength；（f）Variation of the full width at half maximum.
Fig. 6. （a）Real images of the patterned BPLCF at different exposure intensity；（b）Corresponding textures of the edges of the patterned BPLCF.
Fig. 7. （a）Real image of patterned BPLCF；（b）Spectra and texture image of patterned BPLCF.
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Yike DU, Xuejing XU, Han GAO, Jiliang ZHU, Xuan ZHOU. Influence of exposure process on the clarity of blue phase liquid crystal patterns[J]. Chinese Journal of Liquid Crystals and Displays, 2024, 39(6): 743
Category: Research Articles
Received: Apr. 9, 2024
Accepted: --
Published Online: Jul. 30, 2024
The Author Email: Xuan ZHOU (zhouxuan198536@163.com)
