Calibration Method for Alignment Error Caused by Asymmetric Deformation of Mark and Its Application in Overlay Measurement

Juyou Du; Fengzhao Dai; Xiangzhao Wang

doi:10.3788/CJL201946.0704004

Chinese Journal of Lasers, Volume. 46, Issue 7, 0704004(2019)

Calibration Method for Alignment Error Caused by Asymmetric Deformation of Mark and Its Application in Overlay Measurement

Juyou Du^1,2, Fengzhao Dai^1,2、**, and Xiangzhao Wang^1,2、*

Author Affiliations

¹ Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences,Beijing 100049, China

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References(18)

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[12] Menchtchikov B, Socha R, Zheng C M. Reduction in overlay error from mark asymmetry using simulation ORION and alignment models[J]. Proceedings of SPIE, 10587, 105870C(2018). http://adsabs.harvard.edu/abs/2018SPIE10587E..0CM

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Juyou Du, Fengzhao Dai, Xiangzhao Wang. Calibration Method for Alignment Error Caused by Asymmetric Deformation of Mark and Its Application in Overlay Measurement[J]. Chinese Journal of Lasers, 2019, 46(7): 0704004

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Paper Information

Category: measurement and metrology

Received: Jan. 28, 2019

Accepted: Mar. 11, 2019

Published Online: Jul. 11, 2019

The Author Email: Dai Fengzhao (wxz26267@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

DOI:10.3788/CJL201946.0704004

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology