Chinese Optics Letters, Volume. 2, Issue 4, 04187(2004)

Classical simulation of atomic beam focusing and deposition for atom lithography

Xianzhong Chen*, Hanmin Yao, and Xunan Chen
Author Affiliations
  • State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209
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    [2] Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, Fosheng Li, "Quantum simulation for peak broadening in atom lithography," Chin. Opt. Lett. 5, 602 (2007)

    [3] Pingping Zhang, Yan Ma, Tongbao Li, "Feature width miniaturization in atom nanolithography with double standing wave layers," Chin. Opt. Lett. 10, S21403 (2012)

    [4] [in Chinese], [in Chinese], [in Chinese], [in Chinese], "Fabrication of complex nanostructures based on laser manipulation of atoms," Chin. Opt. Lett. 3, 223 (2005)

    [5] Baowu Zhang, Tongbao Li, Yan Ma, "One-dimensional Doppler laser collimation of chromium beam with a novel pre-collimating scheme," Chin. Opt. Lett. 6, 782 (2008)

    [6] Dongqing Zhang, Xiangzhao Wang, Weijie Shi, "A novel method to determine the FOCAL energy range," Chin. Opt. Lett. 3, 10589 (2005)

    [7] Zhang Pingping, Ma Yan, Li Tongbao. Optimization of Particle Optics Model for One-Dimentional Atom Lithography[J]. Acta Optica Sinica, 2011, 31(5): 514004

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    Xianzhong Chen, Hanmin Yao, Xunan Chen, "Classical simulation of atomic beam focusing and deposition for atom lithography," Chin. Opt. Lett. 2, 04187 (2004)

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    Paper Information

    Category: Atomic and Molecular Physics

    Received: Dec. 23, 2003

    Accepted: --

    Published Online: Jun. 6, 2006

    The Author Email: Xianzhong Chen (ioechenxiz@hotmail.com)

    DOI:

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