Chinese Optics Letters, Volume. 2, Issue 4, 04187(2004)

Classical simulation of atomic beam focusing and deposition for atom lithography

Xianzhong Chen*, Hanmin Yao, and Xunan Chen
Author Affiliations
  • State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209
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    We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.

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    Xianzhong Chen, Hanmin Yao, Xunan Chen, "Classical simulation of atomic beam focusing and deposition for atom lithography," Chin. Opt. Lett. 2, 04187 (2004)

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    Paper Information

    Category: Atomic and Molecular Physics

    Received: Dec. 23, 2003

    Accepted: --

    Published Online: Jun. 6, 2006

    The Author Email: Xianzhong Chen (ioechenxiz@hotmail.com)

    DOI:

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