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Acta Optica Sinica, Volume. 36, Issue 1, 112002(2016)

Aberration Measurement Method for Hyper-NA Lithographic Projection Lens

Zhu Boer1,2、*, Wang Xiangzhao1,2, Li Sikun1,2, Yan Guanyong1,2, Shen Lina1,2, and Duan Lifeng3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    Article index updated: Mar. 10, 2025

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    Zhu Boer, Wang Xiangzhao, Li Sikun, Yan Guanyong, Shen Lina, Duan Lifeng. Aberration Measurement Method for Hyper-NA Lithographic Projection Lens[J]. Acta Optica Sinica, 2016, 36(1): 112002

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jun. 30, 2015

    Accepted: --

    Published Online: Dec. 31, 2015

    The Author Email: Boer Zhu (zhuboer@126.com)

    DOI:10.3788/aos201636.0112002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology