Acta Optica Sinica, Volume. 37, Issue 1, 131002(2017)

Influence of Annealing Technology on Spectral Properties of SiCx Thin Films Containing Silicon Quantum Dots

Zhao Fei1,2、*, Yang Wen1,2, Chen Xiaobo1,2, and Yang Peizhi1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Zhao Fei, Yang Wen, Chen Xiaobo, Yang Peizhi. Influence of Annealing Technology on Spectral Properties of SiCx Thin Films Containing Silicon Quantum Dots[J]. Acta Optica Sinica, 2017, 37(1): 131002

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Thin Films

    Received: Aug. 23, 2016

    Accepted: --

    Published Online: Jan. 13, 2017

    The Author Email: Fei Zhao (18487073495@163.com)

    DOI:10.3788/aos201737.0131002

    Topics