Chinese Journal of Lasers, Volume. 31, Issue 5, 535(2004)

940 nm High Power Semiconductor Laser

[in Chinese]*, [in Chinese], [in Chinese], and [in Chinese]
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    References(4)

    [1] [1] G. Erbert, G. Beister, F. Bugge et al.. Performance of 3 W/100 μm stripe diode lasers at 950 nm and 810 nm [C]. SPIE, 2001, 4287:93~102

    [2] [2] E. P. O’Reiley, A. R. Adams. Band-structure engineering in stained semiconductor lasers [J]. IEEE J. Quantum Electron., 1994, 30(2):366~379

    [3] [3] R. M. Kolbas, N. G. Anderson, W. D. Laidig et al.. Strained-layer InGaAs-GaAs-AlGaAs photopumped and current injection lasers [J]. IEEE J. Quantum Electron., 1988, 24(8):1605~1613

    [4] [4] W. W. Chow, S. W. Koch, M. Sarent III. Semiconductor Laser Physics [M]. Berlin Heidelberg: Springer-Verlag, 1994

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. 940 nm High Power Semiconductor Laser[J]. Chinese Journal of Lasers, 2004, 31(5): 535

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    Paper Information

    Category: Laser physics

    Received: Jan. 13, 2003

    Accepted: --

    Published Online: Jun. 12, 2006

    The Author Email: (wcm@cust.edu.cn)

    DOI:

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