Fig. 1. Schematic diagram of AgNW film prepared by spin coating method

Fig. 2. Sheet resistance of AgNW film with different spin coating rates

Fig. 3. Non-uniformity factor of AgNW film with different spin coating rates

Fig. 4. Sheet resistance of AgNW film with different concentration parameters (illustration shows schematic diagram of different measuring points)

Fig. 5. Transmittance of AgNW film with different concentration parameters

Fig. 6. SEM image of AgNW film with different concentration parameters. (a) 0.5 mg/mL; (b) 1.0 mg/mL; (c) 1.5 mg/mL;（e） 2.5 mg/mL；（f） 3.0 mg/mL(d) 2.0 mg/mL; (e) 2.5 mg/mL; (f) 3.0 mg/mL

Fig. 7. FOM of AgNW film with different concentration parameters

Fig. 8. Schematic diagram of AgNWs processed by thermal annealing

Fig. 9. Sheet resistance of AgNW film with different annealing temperatures

Fig. 10. Transmittance of AgNW film with different annealing temperatures

Fig. 11. Planar SEM images of AgNW films after thermal annealing. (a) SEM diagram at annealing temperature of 50 ℃; (b) SEM diagram at annealing temperature of 100 ℃; (c) SEM diagram at annealing temperature of 150 ℃; (d) SEM diagram at annealing temperature of 200 ℃; (e) SEM diagram at annealing temperature of 250 ℃; (f) SEM diagram at annealing temperature of 300 ℃; (g) SEM detail diagram of AgNW junction at annealing temperature of 150 ℃; (h) SEM detail diagram of AgNW junction at annealing temperature of 200 ℃; (i) SEM detail diagram of AgNW junction at annealing temperature of 250 ℃