Laser & Optoelectronics Progress, Volume. 58, Issue 14, 1431001(2021)
Development of a 945-nm Narrowband Filter Based on a Structured Light 3D Imaging Technology
Fig. 2. Refractive index n and extinction coefficient k of Si-H and SiO2. (a) Refractive index; (b) extinction coefficient
Fig. 8. Measuring results of filter fabricated by reactive sputtering. (a)AFM image; (b)SEM image
Fig. 9. Surface roughness of Si-H fabricated by two sputtering methods. (a) Reactive sputtering; (b) DC magnetron sputtering
Fig. 12. Measuring results of filter fabricated by inductively coupled and DC sputtering. (a)AFM image; (b)SEM image
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Boyang Wei, Dongmei Liu, Xiuhua Fu, Jing Zhang, Shuang Li, Bin Zhou. Development of a 945-nm Narrowband Filter Based on a Structured Light 3D Imaging Technology[J]. Laser & Optoelectronics Progress, 2021, 58(14): 1431001
Category: Thin Films
Received: Oct. 16, 2020
Accepted: Nov. 14, 2020
Published Online: Jul. 14, 2021
The Author Email: Boyang Wei (2824155502@qq.com)