Fig. 1. Schematic diagram of semiconductor laser reservoir computing system.半导体激光器储备池计算系统示意图

Fig. 2. (a) Cross correlation of the reservoir consistency; (b) NRMSE of NARMA10 task under the injection strength of 8 ns^–1 and different feedback strengths. 在注入强度为8 ns^–1和不同反馈强度下, (a)储备池一致性的互相关值, (b) NARMA10任务的NRMSE

Fig. 3. (a) Cross correlation of the reservoir consistency; (b) NRMSE of NARMA10 task under the injection strength of 23 ns^–1 and different feedback strengths. 在注入强度为23 ns^–1和不同反馈强度下, (a)储备池一致性的互相关值, (b) NARMA10任务的NRMSE

Fig. 4. Test performances of the RC system based on semiconductor lasers for NARMA10 task under different feedback strengths and injection strengths.不同反馈强度和注入强度下半导体激光器RC系统对NARMA10任务的测试性能

Fig. 5. Nonlinear states of the reservoir under the injection of continuous waveform light, different feedback strengths and injection strengths.连续光注入、不同反馈强度和注入强度下的储备池的非线性状态

Fig. 6. Output powers of the reservoir with the injection of continuous waveform light under (a) better RC performance, (b) general RC performance.RC性能　(a)较好, (b)一般两种情况对应的连续光注入下储备池的输出功率

Fig. 7. The process of selecting the optimal feedback strength and injection strength from three different initialization states.从三种不同的初始化状态选取最佳反馈强度和注入强度的过程