Acta Optica Sinica, Volume. 17, Issue 6, 745(1997)

A Novel Real-Time Etching Depth Testing System for Micro-Fabrication

[in Chinese]1, [in Chinese]2, [in Chinese]2, [in Chinese]2, and [in Chinese]2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    References(1)

    [4] [4] P. Lolodner, A. Katzir, N. Hartsough. End-point detection and etch-rate measurement during reactive ion etching using flourescent polymerfilms. J. Vacuum Sci. & Technol., 1983, B1(2): 50~61

    CLP Journals

    [1] QIU Ke-qiang, ZHOU Xiao-wei, LIU Ying, XU Xiang-dong, LIU Zheng-kun, SHENG Bin, HONG Yi-lin, FU Shao-jun. Ion beam etching of large aperture diffractive optical elements[J]. Optics and Precision Engineering, 2012, 20(8): 1676

    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. A Novel Real-Time Etching Depth Testing System for Micro-Fabrication[J]. Acta Optica Sinica, 1997, 17(6): 745

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Dec. 10, 1995

    Accepted: --

    Published Online: Oct. 31, 2006

    The Author Email:

    DOI:

    Topics