The single-layer films of Al2O3 and MgF2 were deposited upon super polished fused-silica by electron-beam evaporation and were characterized. The subsequent optical constants n and k were reported for the spectral range of 180～230 nm. High-reflectivity (HR) Al2O3/MgF2 mirrors were designed and produced for the wavelength of 193 nm. The annealed mirrors with a reflectance of more than 96% at 193nm were obtained. It was found that the single layers of Al2O3 and MgF2 deposited according to optimized process could get suitable optical properties at 193 nm. And it was easier for HR mirrors to form the oxygen-deficient Al2O3 films than the single layers.