Chinese Journal of Lasers, Volume. 40, Issue 12, 1208001(2013)

Analysis and Metrology of Reproducibility of High-Precision Optic Mount

Wang Hui*, Zhou Feng, Wang Liping, Yu Jie, and Jin Chunshui
Author Affiliations
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    References(10)

    [1] [1] T Miura, K Murakami, H Kawai, et al.. Nikon EUVL development progress update[C]. SPIE, 2010, 7636: 76361G.

    [2] [2] M Lowisch, P Kuerz, H J Mann, et al.. Optics for EUV production[C]. SPIE, 2010, 7636: 763603.

    [3] [3] H Meiling, V Banine, N Harned, et al.. Development of ASML EUV alpha demo tool[C]. SPIE, 2005, 5751: 90-101.

    [4] [4] T Miura, K Murakami, K Suzuki, et al.. Nikon EUVL development progress summary[C]. SPIE, 2006, 6151: 615105.

    [5] [5] R Hudyma. An overview of optical systems for 30 nm resolution lithography at EUV wavelengths[C]. SPIE, 2002, 4832: 137-148.

    [6] [6] Yang Guanghua, Li Yanqiu. Thermal and structural deformation of projection optics and its influence on optical imaging performance for 22nm extreme ultraviolet lithography[J]. Acta Optica Sinica, 2012, 32(3): 0322005.

    [8] [8] Zhong Xianyun, Fan Bin, Zeng Zhige, et al.. Design simulation and optimization for the flexible displacement support structure based on 1.8 m lightweight reflector[J]. Acta Optica Sinica, 2012, 32(3): 0322002.

    [9] [9] D A Tichenor, G D Kubiak, W C Replogle, et al.. EUV engineering test stand[C]. SPIE, 2000, 3997: 48-69.

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    Wang Hui, Zhou Feng, Wang Liping, Yu Jie, Jin Chunshui. Analysis and Metrology of Reproducibility of High-Precision Optic Mount[J]. Chinese Journal of Lasers, 2013, 40(12): 1208001

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    Paper Information

    Category: measurement and metrology

    Received: Jul. 2, 2013

    Accepted: --

    Published Online: Oct. 20, 2013

    The Author Email: Hui Wang (wangh-19850322@163.com)

    DOI:10.3788/cjl201340.1208001

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