Researching | Groove Profile Prediction of Grating Masks in Scanning Beam Interference Lithography

Acta Optica Sinica, Volume. 38, Issue 5, 0505001(2018)

Groove Profile Prediction of Grating Masks in Scanning Beam Interference Lithography

Sen Lu^1,2, Kaiming Yang^1、*, Yu Zhu^1,2, Leijie Wang^1,2, and Ming Zhang^1,2

Author Affiliations

¹ State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China

² Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipment and Control, Tsinghua University, Beijing 100084, China

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Figures&Tables (8)

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Figures & Tables(8)

Fig. 1. Schematic of SBIL

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Fig. 2. Schematic of light wave propagating in photoresist layer

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Fig. 3. Normalized exposure within photoresist

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Fig. 4. Schematic of FMM

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Fig. 5. Profile evolution curves under influence of standing wave effect

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Fig. 6. Reflectivity versus thickness of ARC

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Fig. 7. Profile evolution curves after elimination of standing wave effect

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Table 1. Simulation parameters

Table 1. Simulation parameters

Parameter	Content
Wavelength	355 nm
Incident angle	45°
Refractive index of air	1.0
Refractive index of photoresist	1.71-0.018i
Thickness of photoresist	400 nm
Refractive index of ARC	1.82-0.34i
Refractive index of substrate	0.883-2.778i

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Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Groove Profile Prediction of Grating Masks in Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2018, 38(5): 0505001

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Paper Information

Category: Diffraction and Gratings

Received: Sep. 27, 2017

Accepted: --

Published Online: Jul. 10, 2018

The Author Email: Yang Kaiming ( yangkm@tsinghua.edu.cn)

DOI:10.3788/AOS201838.0505001

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology