Fig. 1. Schematic diagrams of solid-source ECR sputtering deposition system. (a) Low-energy plasma cleaning; (b) AlN thin film deposition

Fig. 2. Refractive index and extinction coefficient of AlN measured by ellipsometry

Fig. 3. Three dimensional morphologies. (a) ECR-sputtered AlN film; (b) deposited Al₂O₃ film by E-beam

Fig. 4. TEM images. (a) ECR-sputtered AlN/Al₂O₃ films; (b) deposited AlN/Al₂O₃ film by E-beam

Fig. 5. 638 nm semiconductor laser. (a) Device structure; (b) package structure

Fig. 6. Reflectivity curves of AR and HR films

Fig. 7. Normalized power degradation curves of lasers. (a) ECR-sputtered AlN/Al₂O₃ films; (b) deposited Al₂O₃ film by E-beam

Fig. 8. Power curves of lasers before and after aging. (a) ECR-sputtered AlN/Al₂O₃ films; (b) deposited Al₂O₃ film by E-beam

Fig. 9. Comparison of power density