Acta Optica Sinica, Volume. 30, Issue 2, 525(2010)
Analysis of Effective Wave-Front Affecting Diffraction Field in Proximity Lithography
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Li Mujun, Shen Lianguan, Zhao Wei, Zheng Jinjin, Zhou Jie. Analysis of Effective Wave-Front Affecting Diffraction Field in Proximity Lithography[J]. Acta Optica Sinica, 2010, 30(2): 525
Paper Information
Category: Optical Design and Fabrication
Received: Apr. 9, 2009
Accepted: --
Published Online: Feb. 2, 2010
The Author Email: Mujun Li (lmn@mail.ustc.edu.cn)
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