Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography

Wei Cheng; Sikun Li; Zinan Zhang; Xiangzhao Wang

doi:10.3788/LOP202259.0922022

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922022(2022)

Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography

Wei Cheng^1,2, Sikun Li^1,2, Zinan Zhang^1,2, and Xiangzhao Wang^1,2、*

¹Laboratory of Information Optics and Opt-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Figures & Tables(6)

Fig. 1. Simplified model for defective EUV multilayer based on single surface approximation^[10]

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Fig. 2. Simulation model based on equivalent film layer method. (a) Partition of defective multilayer; (b) thickness distribution of layers for defect-free and defective multilayer ^[5]

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Fig. 3. Schematic diagram of the optical setup for the ABI^[40]

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Fig. 4. Flow chart of the defect profile parameter reconstruction^[19]

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Fig. 5. Schematic diagram of two initialization repair patterns. (a) Initialization pattern 1; (b) initialization pattern 2^[4]

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Table 1. Penetration depth of different wavelengths used in the EUV multilayer ^[37]
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Table 1. Penetration depth of different wavelengths used in the EUV multilayer ^[37]
Wavelength /nm 13.5 193/199 257/266 365 488 532 e-beam
Penetration depth（bi-layers） 31 3 2 5 12 11 1-2

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Wei Cheng, Sikun Li, Zinan Zhang, Xiangzhao Wang. Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922022

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Paper Information

Category: Optical Design and Fabrication

Received: Mar. 28, 2022

Accepted: Apr. 12, 2022

Published Online: May. 10, 2022

The Author Email: Xiangzhao Wang (wxz26267@siom.ac.cn)

DOI:10.3788/LOP202259.0922022

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Penetration depth of different wavelengths used in the EUV multilayer [37]

Table 1. Penetration depth of different wavelengths used in the EUV multilayer [37]

Table 1. Penetration depth of different wavelengths used in the EUV multilayer ^[37]

Table 1. Penetration depth of different wavelengths used in the EUV multilayer ^[37]