Opto-Electronic Engineering, Volume. 49, Issue 11, 220066(2022)
Vortex field manipulation based on deformation mirror with continuous surface
Fig. 1. Schematic diagram of the vortex beam generated by continuous mirror deformation mirror
Fig. 2. Schematic diagram of using DM to generate vortex beams.L1, L2, L3: convex lens; T: aperture; DM: deformation mirror; f: focal length
Fig. 3. Fitting of the integer order spiral wavefront. (a)~(e) Target wavefront with the integer order l =1~5; (f)~(j) Fitting wavefront of the integer order l=1~5
Fig. 4. Fitting of integer order vortex beams with topological charge is 2. (a) Unfiltered intensity at u2; (b) Filtered intensity at u4; (c) Unfiltered phase at u2; (d) Filtered phase at u4
Fig. 5. The light field and phase of the integer order vortex beam after focusing and filtering. (a)~(d) Intensity with topological charges l=1, 3, 4, and 5; (e)~(h) Phase with topological charges l=1, 3, 4, and 5
Fig. 6. Fitting of the fractional order spiral wavefront. (a)~(e) Target wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5; (f)~(j) Fitting wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5
Fig. 7. Filtering results of the fractional order vortex beam. (a)~(e) Intensity of target wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4; (f)~(j) Intensity of fitting wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4
Fig. 8. Filtering results of the fractional order vortex beam. (a)~(e) Phase of target wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4; (f)~(j) Phase of fitting wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4
Fig. 9. Fitting of multi-fractional spiral wavefront. (a), (b) Target wavefront; (c), (d) Fitting wavefront
Fig. 10. The light field and phase of the multi-fractional order target wavefront and the fitting wavefront after filtering. (a), (b) Intensity of multi-fractional order target wavefront at u4; (c), (d) Intensity of multi-fractional order fitting wavefront at u4; (e), (f) Phase of multi-fractional order target wavefront at u4; (g), (h) Phase of multi-fractional order fitting wavefront at u4
Fig. 11. Superposition target wavefront and fitting wavefront. (a)~(d) Target wavefront with topological charges l=±1, ±2, ±3, and ±4; (e)~(h) Fitting wavefront with topological charges l=±1, ±2, ±3, and ±4
Fig. 12. The light field and phase of the superposition fitting wavefront after filtering. (a)~(d) Intensity of fitting wavefront at with topological chrages l=±1,±2,±3, and ±4 at u4; (e)~(h) Phase of fitting wavefront at with topological chrages l=±1,±2,±3, and ±4 at u4
Fig. 13. The mode purity of the superposition fitting wavefront after filtering. (a) l=±1; (b) l=±2; (c) l=±3; (d) l=±4
Fig. 14. Dynamic manipulation of integer order vortex beams. (a1)~(a6) Intensity with topological charge l=2; (b1)~(b6) Spiral phase with topological charge l= 2; (c1)~(c6) Intensity with topological charge l=3; (d1)~(d6) Spiral phase with topological charge l= 3
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Guangyun Xiong, Ao Tang, Bin Lan, Feng Shen. Vortex field manipulation based on deformation mirror with continuous surface[J]. Opto-Electronic Engineering, 2022, 49(11): 220066
Category: Article
Received: Apr. 27, 2022
Accepted: Jul. 16, 2022
Published Online: Dec. 27, 2022
The Author Email: Feng Shen (shenfeng@ioe.ac.cn)