Opto-Electronic Engineering, Volume. 49, Issue 11, 220066(2022)

Vortex field manipulation based on deformation mirror with continuous surface

Guangyun Xiong1,2,3, Ao Tang1,2,3, Bin Lan1,2, and Feng Shen1,2、*
Author Affiliations
  • 1Key Laboratory on Adaptive Optics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
  • 2Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(14)
    Schematic diagram of the vortex beam generated by continuous mirror deformation mirror
    Schematic diagram of using DM to generate vortex beams.L1, L2, L3: convex lens; T: aperture; DM: deformation mirror; f: focal length
    Fitting of the integer order spiral wavefront. (a)~(e) Target wavefront with the integer order l =1~5; (f)~(j) Fitting wavefront of the integer order l=1~5
    Fitting of integer order vortex beams with topological charge is 2. (a) Unfiltered intensity at u2; (b) Filtered intensity at u4; (c) Unfiltered phase at u2; (d) Filtered phase at u4
    The light field and phase of the integer order vortex beam after focusing and filtering. (a)~(d) Intensity with topological charges l=1, 3, 4, and 5; (e)~(h) Phase with topological charges l=1, 3, 4, and 5
    Fitting of the fractional order spiral wavefront. (a)~(e) Target wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5; (f)~(j) Fitting wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5
    Filtering results of the fractional order vortex beam. (a)~(e) Intensity of target wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4; (f)~(j) Intensity of fitting wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4
    Filtering results of the fractional order vortex beam. (a)~(e) Phase of target wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4; (f)~(j) Phase of fitting wavefront with topological charges l=0.5, 1.5, 2.5, 3.5, and 4.5 at u4
    Fitting of multi-fractional spiral wavefront. (a), (b) Target wavefront; (c), (d) Fitting wavefront
    The light field and phase of the multi-fractional order target wavefront and the fitting wavefront after filtering. (a), (b) Intensity of multi-fractional order target wavefront at u4; (c), (d) Intensity of multi-fractional order fitting wavefront at u4; (e), (f) Phase of multi-fractional order target wavefront at u4; (g), (h) Phase of multi-fractional order fitting wavefront at u4
    Superposition target wavefront and fitting wavefront. (a)~(d) Target wavefront with topological charges l=±1, ±2, ±3, and ±4; (e)~(h) Fitting wavefront with topological charges l=±1, ±2, ±3, and ±4
    The light field and phase of the superposition fitting wavefront after filtering. (a)~(d) Intensity of fitting wavefront at with topological chrages l=±1,±2,±3, and ±4 at u4; (e)~(h) Phase of fitting wavefront at with topological chrages l=±1,±2,±3, and ±4 at u4
    The mode purity of the superposition fitting wavefront after filtering. (a) l=±1; (b) l=±2; (c) l=±3; (d) l=±4
    Dynamic manipulation of integer order vortex beams. (a1)~(a6) Intensity with topological charge l=2; (b1)~(b6) Spiral phase with topological charge l= 2; (c1)~(c6) Intensity with topological charge l=3; (d1)~(d6) Spiral phase with topological charge l= 3
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    Guangyun Xiong, Ao Tang, Bin Lan, Feng Shen. Vortex field manipulation based on deformation mirror with continuous surface[J]. Opto-Electronic Engineering, 2022, 49(11): 220066

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    Paper Information

    Category: Article

    Received: Apr. 27, 2022

    Accepted: Jul. 16, 2022

    Published Online: Dec. 27, 2022

    The Author Email: Feng Shen (shenfeng@ioe.ac.cn)

    DOI:10.12086/oee.2022.220066

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