Opto-Electronic Engineering, Volume. 35, Issue 9, 41(2008)

Design of Cavity Facet Reflectivity for 808 nm Semiconductor Lasers

DU Wei-hua1,2、*, YANG Hong-wei2, CHEN Guo-ying1, CHEN Hong-tai2, LI Ya-jing1,2, and PENG Hai-tao1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(5)

    [1] [1] Crump P,Dong W M,Grimshaw M,et al.100-W+diode laser bars show>71% power conversion from 790-nm to 1000-nm and have clear route to>85%[J].SPIE,2007,6456:64560M

    [2] [2] Peters M,Rossin V,Everett M,et al.High-power,high-efficiency laser diodes at JDSU[J].SPIE,2007,6456:64560G

    [3] [3] John G Endfiz,Mitral Vakili,Gerald S Browder,et al.High power diode laser arrays[J].IEEE Journal of quantum electronics,1992,28(4):952-965

    [5] [5] Panchal C J,Mistry S N,Patel N K M,et al.Facet coating of diode laser for high power and high reliable operation[J].SPIE,2003,4829:18-19

    [6] [6] Higashi T,Ogita S,Soda H,et al.Optimum Asymmetric Mirror Facet Structure for High-efficiency Semiconductor Lasers[J].IEEE J.Quantum Electron,1993,29(8):1918-1923

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    DU Wei-hua, YANG Hong-wei, CHEN Guo-ying, CHEN Hong-tai, LI Ya-jing, PENG Hai-tao. Design of Cavity Facet Reflectivity for 808 nm Semiconductor Lasers[J]. Opto-Electronic Engineering, 2008, 35(9): 41

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    Paper Information

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    Received: Feb. 29, 2008

    Accepted: --

    Published Online: Mar. 1, 2010

    The Author Email: Wei-hua DU (dwhuk@126.com)

    DOI:

    CSTR:32186.14.

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