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Acta Optica Sinica, Volume. 37, Issue 2, 231001(2017)

Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique

Liu Huasong1,2、*, Wang Lishuan1,2, Yang Xiao1, Liu Dandan1, Jiang Chenghui1, Jiang Yugang1, Ji Yiqin1,2, Zhang Feng1, and Chen Deying2
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    Liu Huasong, Wang Lishuan, Yang Xiao, Liu Dandan, Jiang Chenghui, Jiang Yugang, Ji Yiqin, Zhang Feng, Chen Deying. Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique[J]. Acta Optica Sinica, 2017, 37(2): 231001

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    Paper Information

    Category: Thin Films

    Received: Aug. 29, 2016

    Accepted: --

    Published Online: Feb. 13, 2017

    The Author Email: Huasong Liu (liuhuasong@hotmail.com)

    DOI:10.3788/aos201737.0231001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology