Interferometry is among the widely-used precise metrologies in varieties of science and engineering fields. An easy-to-control moire interferometric angular measurement method based on multi-diffraction of dual gratings is proposed, to facilitate tilt remediation and in-plane angle adjustment between mask and substrate in proximity lithography, as well as related applications in micro/nano devices and micro-optoelectronics system etc. This method aims to take advantages of symmetric and similar orders generated from dual-gratings diffractions to realize the (m, -m) and (m, 0) interferometry, in which fields with phase distribution associated with tilt and in-plane angle are formed. The fundmental of presented moire interferometry is derived in detail and related schemes of (m, -m) and (m, 0) interferometric measurement are introduced. Specifically, both schemes monitor the tilt and in-plane angle according to the fringe deflection and frequency variation in an on-axis and off-axis manner respectively. Corresponding composite gratings are designed for experimental verification. Experimental and analytical results indicate that the tilt and in-plane angle can be adjusted with an accracy below 10-3 rad and 10-4 rad, respectively.