Organic light-emitting devices (OLEDs) have been developed and applied rapidly in the past three decades as both display and lighting panels due to their advantages. However, inherent low light extraction efficiency always makes them require to integrating the light extraction micro/nano structures. On the other hand, organic semiconductor laser (OSL) also has attracted much attention due to the advantages of wide emission spectrum, simple fabrication, low cost and easy integration. Also, micro/nano structures should be fabricated in the OSL as resonator geometries for optical feedback to achieve lasing action. Among the different fabrication techniques, nanoimprint lithography (NIL) as a patterning process with high-resolution, high-throughput and cost effective, is considered to be one of the most promising technologies. NIL not only can break the limitation from diffraction limit and beam scattering, but also guarantee the inherent optical and electronic properties of organic optoelectronic materials. Here, we summarize and evaluate the fabrication of nanostructured electrode, functional layers and encapsulation films in the OLEDs and nanostructured dye-doped polymer and luminescent materials in the OSLs.