Chinese Optics Letters, Volume. 3, Issue 2, 0263(2005)

In-situ end-point detection during ion-beam etching of multilayer dielectric gratings

Hua Lin*, Lifeng Li, and Lijiang Zeng
Author Affiliations
  • State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084
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    References(8)

    [1] [1] B. W. shore, M. D. Perry, J. A. Britten, R. D. Boyd, M. D. Feit, H. T. Nguyen, R. Chow, G. E. Loomis, and L. F. Li, J. Opt. Soc. Am. A 14, 1124 (1997).

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    [3] [3] S. Bosch-Charpenay, J. Z. Xu, J. Haigis, P. A. Rosenthal, P. R. Solomon, and J. M. Bustillo, J. Microelectromech. Syst. 11, 111 (2002).

    [4] [4] M. M. Bourke, K. P. Hilton, M. A. Crouch, M. J. Kane, N. Borsing, and T. Russell, in IEEE Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications 14 (1995).

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    [7] [7] J. S. Zhao, L. F. Li, and Z. H. Wu, Acta Opt. Sin. (in Chinese) 24, 851 (2004).

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    Hua Lin, Lifeng Li, Lijiang Zeng, "In-situ end-point detection during ion-beam etching of multilayer dielectric gratings," Chin. Opt. Lett. 3, 0263 (2005)

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    Paper Information

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    Received: Jul. 21, 2004

    Accepted: --

    Published Online: Jun. 6, 2006

    The Author Email: Hua Lin (linh02@mails.tsinghua.edu.cn)

    DOI:

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