Chinese Optics Letters, Volume. 11, Issue s1, S10205(2013)
Anti-reflection coating at 550 nm fabricated by atomic layer deposition
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Yanghui Li, Weidong Shen, Yueguang Zhang, Xiang Hao, Huanhuan Fan, Xu Liu, "Anti-reflection coating at 550 nm fabricated by atomic layer deposition," Chin. Opt. Lett. 11, S10205 (2013)
Category: Deposition and process control
Received: Dec. 12, 2012
Accepted: Dec. 27, 2012
Published Online: May. 30, 2013
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