Dual-Beam Laser Direct Writing Nano-Lithography System Based on Peripheral Photoinhibition Technology

Guozun Zhou; Minfei He; Zhenyao Yang; Chun Cao; Fei Xie; Yaoyu Cao; Cuifang Kuang; Xu Liu

doi:10.3788/CJL202249.0202001

Chinese Journal of Lasers, Volume. 49, Issue 2, 0202001(2022)

Dual-Beam Laser Direct Writing Nano-Lithography System Based on Peripheral Photoinhibition Technology

Guozun Zhou^1、†, Minfei He^1、†, Zhenyao Yang², Chun Cao², Fei Xie³, Yaoyu Cao³, Cuifang Kuang^1,2、*, and Xu Liu^1,2、**

¹State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China

²Research Center for Smart Sensing, Zhejiang Laboratory, Hangzhou, Zhejiang 310023, China

³Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications, Institute of Photonics Technology, Jinan University, Guangzhou, Guangdong 510000, China

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Guozun Zhou, Minfei He, Zhenyao Yang, Chun Cao, Fei Xie, Yaoyu Cao, Cuifang Kuang, Xu Liu. Dual-Beam Laser Direct Writing Nano-Lithography System Based on Peripheral Photoinhibition Technology[J]. Chinese Journal of Lasers, 2022, 49(2): 0202001

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Paper Information

Category: laser manufacturing

Received: Apr. 1, 2021

Accepted: Aug. 16, 2021

Published Online: Dec. 1, 2021

The Author Email: Kuang Cuifang (cfkuang@zju.edu.cn), Liu Xu (liuxu@zju.edu.cn)

DOI:10.3788/CJL202249.0202001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology